# Advancing EUV photolithography

Discovering new photoresists to minimize blur in chipmaking.

Smaller, more powerful electronics demand more advanced semiconductor chips. EUV lithography, the current cutting-edge process technology for beyond the 5nm node, faces limits.

## Problem

A major bottleneck in EUV lithography is **radiation-induced blur.** High-energy electrons scatter and diffuse, blurring intricate patterns and degrading resolution, thus **hindering miniaturization.** Current classical simulations are insufficient to model these quantum interactions, making new photoresist material design difficult.

## Solution

Our novel approach uses **quantum simulation to model atomic-scale light-matter interactions** in photoresists. This framework predicts EUV absorption cross-sections and photoemission energies to parameterize classical simulations of electron diffusion and blur.

This tool enables next-gen photoresist design. Mitigating radiation-induced blur unlocks the full potential of EUV lithography for smaller, more powerful, and efficient semiconductor chips.

## Learn More

- ### [Quantum Simulations for Extreme Ultraviolet Photolithography](https://arxiv.org/abs/2602.20234)

[February 23, 2026](https://arxiv.org/abs/2602.20234)
- ### [Xanadu and Mitsubishi Chemical to Collaborate on Developing Quantum Algorithms for EUV Lithography](/content/press/xanadu-and-mitsubishi-chemical-to-collaborate-on-developing-quantum-algorithms-for-euv-lithography/index.html)

[July 2, 2025](/content/press/xanadu-and-mitsubishi-chemical-to-collaborate-on-developing-quantum-algorithms-for-euv-lithography/index.html)

## Where quantum meets industry

Xanadu is focused on building useful quantum computers to solve the world's most intractable computational problems.